The high resolution resists.

Molecular Glass Resists for High Resolution Patterning

The idea of using small molecules instead of polymers for next generation lithography may enable improved resolution and line edge roughness (LER). Rather than using polymeric materials, we are focusing on a new class of materials known as molecular glasses (MGs). These are low molecular weight organic materials that demonstrate high glass transition temperatures (Tg) despite their modest size....

Molecular Glass Resists for High Resolution Lithographic Patterning

The microelectronics industry is increasingly looking towards high resolution lithographic techniques, such as electron beam (E-Beam) and extreme ultraviolet (EUV) lithography, in order to fabricate sub 100 nm features. Complimentary to this field of research is the design and evaluation of new photoresists to enable such processes. Molecular glass resists are possible candidates for this appli...

Implantable Microsystems for High-Resolution Interfacing to the Brain

implantable microsystems for high-resolution interfacing to the brain

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Resists, Developers and Removers

Positive resists form an indene carboxylic acid during exposure making them soluble in aqueous alkaline solutions. Therefore, positive resists develop where they have been exposed, while the unexposed areas remain on the substrate. Since positive resists do not cross-link, the resist structures rounden beyond their softening point of typically 100-130°C. Negative resists such as the AZ® nLOF 20...